International Symposium on Optical and Optoelectronic Applied Science and Engineering
International Symposium on Optical and Optoelectronic Applied Sciences and Engineering
VIAF ID: 154844249 ( Corporate )
Permalink: http://viaf.org/viaf/154844249
Preferred Forms
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- 110 2 _ ‡a International Symposium on Optical and Optoelectronic Applied Sciences and Engineering
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- 111 2 _ ‡a International Symposium on Optical and Optoelectronic Applied Sciences and Engineering
- 111 2 _ ‡a International Symposium on Optical and Optoelectronic Applied Sciences and Engineering
4xx's: Alternate Name Forms (13)
5xx's: Related Names (2)
- 511 2 _ ‡a International Technical Symposium on Optical and Electro-Optical Applied Science and Engineering ‡y Fra nr 3(1986) med sistnevnte tittel
- 511 2 _ ‡a International Technical Symposium on Optical and Electro-optical Applied Science and Engineering
Works
Title | Sources |
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Advanced algorithms and architectures for signal processing IV : 8-10 August 1989, San Diego, California | |
High power lasers, c1987: | |
Image algebra and morphological image processing : 10-12 July 1990, San Diego, California | |
Integrated optical circuit engineering III : 16-18 April 1986, Innsbruck, Austria | |
Laser interferometry : quantitative analysis of interferograms : third in a series : 7-9 August 1989, San Diego, California | |
Materials, devices, techniques, and applications for Z-plane focal plane array technology II : 12-13 July 1990, San Diego, Calif. | |
Nonlinear optical properties of organic materials III : 11-13 July 1990, San Diego, California | |
Optical instrumentation for biomedical laser applications : 17-18 April 1986, Innsbruck, Austria | |
Optical materials technology for energy efficiency and solar energy conversion V, c1986: | |
Optical surfaces resistant to severe environments : 11-12 July 1990, San Diego, California | |
Optical systems for space applications : 30 March-1 April 1987, The Hague, The Netherlands | |
Optical testing and metrology III recent advances in industrial optical inspection : 8-13 July 1990, San Diego, California | |
Polarization considerations for optical systems II, c1990: | |
Scanning imaging technology : 2-3 April 1987, The Hague, The Netherlands | |
Thin film technologies II : 15-17 April 1986, Innsbruck, Austria | |
Ultrahigh- and high-speed photography, videography, photonics and velocimetry '90 : eighth in a series : 10-13 July 1990, San Diego, California | |
Ultraviolet technology III : 10-11 August 1989, San Diego, California | |
X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California |