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Ntsoenzok, Esidor ISNI Sudoc [ABES], France

VIAF ID: 214151318 (Personal)

Permalink: http://viaf.org/viaf/214151318

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Title Sources
Characterization, understanding and modelling of the evolution of the defects induced by the cycles of processes in the silicon. Sudoc [ABES], France
Etude de la croissance thermique des cavités induites par l'implantation d'hélium dans le silicium Sudoc [ABES], France
Fracture dynamics analysis on Smart Cut™ technology. Sudoc [ABES], France
L'IMPLANTATION DES IONS DANS LES SEMICONDUCTEURS ET SES APPLICATIONS Sudoc [ABES], France
Piégeage des impuretés métalliques présentes dans le silicium destiné au photovoltaïque par plasma immersion ion implantation (PIII) Sudoc [ABES], France
Réalisation de jonctions ultra courtes par multi-implantation dans du Si Sudoc [ABES], France
Silicon layer separation by high energy hydrogen implantation for photovoltaic applications. Sudoc [ABES], France
Study of Silica implanted krypton or xenon : evolution of dielectric constant. Sudoc [ABES], France
Study of the thermal growth of cavities induced by helium implantation in silicon. Sudoc [ABES], France

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