Ducroquet, Frédérique

VIAF ID: 188498256 (Personal)

Title	Sources
Caractérisation d'oxydes cristallins à haute permittivité (LaAIO3, SrTiO3) en vue d'une intégration en microélectronique igh-K crystalline dielectric (LaAlO3, SrTiO3) characterization for integration in microelectronic applications
Electrical characterization of the quaternary (Ga0,47In0,53As)1-x (Al0,48In0.52 As)x (x=30%) and its application to the HFET transistor for photo-detection at 13-1.55μm. .
Etude de caractérisation de matériaux diélectriques de grille à forte permittivité pour les technologies CMOS ultimes haracterisation of high permittivity gate dielectric materials for ultimate CMOS technology
Etude des propriétés électroniques de couches minces de CZTSSe
Etude, fabrication et propriétés de transport de transistors CMOS associant un diélectrique haute permittivité et un canal de conduction haute mobilité Study, fabrication and transport properties of high mobility channel CMOS transistors with high-k gate dielectrics
Influence des niveaux profonds et des phénomènes de surface sur les caractéristiques électriques de photodiodes GaInAs = fluence of deep levels and surface phenomena on the electrical properties of GaInAs photodiodes
Study of electronic conduction mecanisms at low temperature for the measurement of the dopant content in photovoltaic silicon.
Study of electronics properties of thin films CZTSSe.