Electrochemical Society. Dielectric Science and Technology Division
Electrochemical Society
Electrochemical society Etats-Unis, Dielectric science and technology division
VIAF ID: 265561528 ( Corporate )
Permalink: http://viaf.org/viaf/265561528
Preferred Forms
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- 110 2 _ ‡a Electrochemical Society
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- 110 2 _ ‡a Electrochemical Society ‡b Dielectric Science and Technology Division
- 110 2 _ ‡a Electrochemical Society. Dielectric Science and Technology Division
- 110 2 0 ‡a Electrochemical Society. ‡b Dielectric Science and Technology Division
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- 110 2 _ ‡a Electrochemical society (Etats-Unis). ‡b Dielectric science and technology division
- 210 | | ‡a Electrochemical society ‡c Etats-Unis ‡b Dielectric science and technology division
4xx's: Alternate Name Forms (28)
5xx's: Related Names (8)
- 510 0 2 ‡5 a ‡a American Electrochemical Society
- 510 2 _ ‡a American Electrochemical Society
- 510 2 _ ‡a Electrochemical Society
- 510 2 _ ‡a Electrochemical Society. ‡b Dielectrics and Insulation Division
- 510 2 0 ‡a Electrochemical Society. ‡b Dielectrics and Insulation Division
- 510 2 _ ‡a Electrochemical Society ‡b Dielectrics and Insulation Division
- 510 2 _ ‡a Electrochemical Society ‡b Dielectrics and Insulation Division ‡4 vorg ‡4 https://d-nb.info/standards/elementset/gnd#precedingCorporateBody ‡e Vorgaenger
- 510 2 _ ‡a Electrochemical Society ‡4 adue ‡4 https://d-nb.info/standards/elementset/gnd#hierarchicalSuperiorOfTheCorporateBody ‡e Ueberordnung
Works
Title | Sources |
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Advanced short-time thermal processing for Si-based CMOS devices two | |
Chemical sensors 7 -and- MEMS/NEMS 7 | |
Diamond materials IV | |
Long wavelength infrared detectors and arrays: physics and applications VI | |
Metal-slag-gas reactions and processes | |
Metallized plastics fundamental and applied aspects | |
Microstructures and microfabricated systems two | |
The physics and chemistry of SiO₂ and the Si-SiO₂ interface--4, 2000, c2000: | |
Proceedings of the ... Canadian Hydrogen Workshop. | |
Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI | |
Proceedings of the symposia on reliability of semiconductor devices/interconnections and dielectric breakdown, and laser process for microelectronic applications | |
Proceedings of the Symposium on Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Synthesis | |
Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control | |
Proceedings of the Symposium on the Degradation of Electronic Devices Due to Device Operation as Well as Crystalline and Process-Induced Defects | |
Proceedings of the Thirteenth State-of-the Art Program on Compound Semiconductors (SOTAPOCS XIII) and the Symposium on Metallization of III-V Compound Semiconductors | |
Quantum confinement--nanostructures | |
Silicon materials science and technology X, 2006: | |
Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium | |
Silicon nitride, silicon dioxide, and emerging dielectrics 9 | |
Symp. on Automated Integrated Circuits Manufacturing (7th : 1991 : Phoenix, Ariz.). Proceedings of the Seventh Symposium ... c1992: | |
Symp. on Plasma Processing (1990 : Montréal, Québec). Proceedings of the Eighth Symp. on Plasma Processing, c1990: | |
TFT 8 | |
TFTT IV | |
Thin film materials for advanced packaging technologies | |
Thin film processes | |
Thin film transistor technology eight | |
Wide bandgap semiconductors and devices/SOTAPOCS XXIII |