Šikola, Tomáš, 1957-
Tomáš Šikola Narozen 23.1.1957 v Brně. Doc., RNDr., práce z fyzikálního inženýrství.
VIAF ID: 84597316 (Personal)
Permalink: http://viaf.org/viaf/84597316
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Works
Title | Sources |
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Analysis of thin films by time-of-flight low energy ion scattering | |
Modeling of plasmon-enhanced photoluminescence of Si nanocrystals embedded in thin silicon-rich oxinitride layer | |
Surfaces and thin films - the key to nanotechnologies | |
Type-I and type-II confinement in quantum dots : excitonic fine structure |