Kessels, Wilhelmus Mathijs Marie, 1973-
Wilhelmus M M Kessels wetenschapper
Kessels, Wilhelmus Mathijs Marie
Kessels, Erwin
VIAF ID: 78454377 (Personal)
Permalink: http://viaf.org/viaf/78454377
Preferred Forms
- 100 1 _ ‡a Kessels, Erwin
- 100 1 _ ‡a Kessels, Wilhelmus Mathijs Marie
- 100 1 _ ‡a Kessels, Wilhelmus Mathijs Marie ‡d 1973-
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- 100 1 _ ‡a Kessels, Wilhelmus Mathijs Marie, ‡d 1973-
- 100 0 _ ‡a Wilhelmus M M Kessels ‡c wetenschapper
4xx's: Alternate Name Forms (5)
Works
Title | Sources |
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Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle. | |
Chemical Analysis of the Interface between Hybrid Organic-Inorganic Perovskite and Atomic Layer Deposited AlO | |
Development and properties of all-dielectric and metal-dielectric heterostructures at atomic scale | |
Développement et caractérisation de contacts passivés avec recuit rapide à haute température pour la fabrication de cellules solaires en silicium de type p.. | |
Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer. | |
Initial Growth Study of Atomic-Layer Deposition of Al2O3 by Vibrational Sum-Frequency Generation | |
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O Plasma | |
Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO as an Electron Transport Layer in Planar Perovskite Solar Cells | |
Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO2 Atomic Layer Deposition | |
Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers | |
Remote plasma deposition of hydrogenated amorphous silicon, 2000: | |
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies. |