Gouraud, Pascal
VIAF ID: 73146029439035820329 ( Personal )
Permalink: http://viaf.org/viaf/73146029439035820329
Preferred Forms
- 100 1 _ ‡a Gouraud, Pascal
Works
Title | Sources |
---|---|
Development and optimization of a polysilicon gate etch process for the 45 and 32 nanometer technology node. | |
Développement et optimisation d’un procédé de gravure grille polysilicium pour les nœuds technologiques 45 et 32 nm | |
Plasma etching of high-χ block copolymers. |