真壁利明
真壁, 利明, 1947-
真壁, 利明
VIAF ID: 258680609 (Personal)
Permalink: http://viaf.org/viaf/258680609
Preferred Forms
- 100 1 _ ‡a 真壁, 利明
- 100 1 _ ‡a 真壁, 利明, ‡d 1947-
- 100 0 _ ‡a 真壁利明
4xx's: Alternate Name Forms (8)
Works
Title | Sources |
---|---|
21seiki sōzō gijutsu rikkoku eno michi | |
21世紀創造技術立国への道 | |
Advances in low temperature RF plasmas : basis for process design | |
Control of charging in high aspect ratio plasma etching of integrated circuits | |
Data and modeling of negative ion transport in gases of interest for production of integrated circuits and nanotechnologies | |
Diffusion of electrons in time-dependentE(t)×B(t) fields | |
The effect of topographical local charging on the etching of deep-submicron structures in SiO2 as a function of aspect ratio | |
Influence of frequency, pressure, and mixture ratio of electronegative gas on electrical characteristics of rf discharges in N2‐SF6mixtures | |
Kakuritsukatei | |
Modeling and diagnostics of the structure of rf glow discharges in Ar at 13.56 MHz | |
Monte Carlo analysis of ionization effects on spatiotemporal electron swarm development | |
Negative mobilities of electrons in radio frequency fields | |
Non-equilibrium plasmas in telecommunication related technologies | |
Optical emission diagnostics of etching of low-k dielectrics in a two frequency inductively coupled plasma | |
Plasma electronics : applications in microelectronic device fabrication | |
Purazuma erekutoronikusu | |
The Radical Transport in the Narrow-Gap-Reactive-Ion Etcher in SF6by the Relaxation Continuum Model | |
Spatiotemporal optical emission spectroscopy of rf discharges in SF6 | |
Transition between capacitive and inductive mode in inductively coupled plasma observed by emission computerized tomography | |
Transport coefficients and scattering cross-sections for plasma modelling in CF4-Ar mixtures: a swarm analysis | |
Transport coefficients for electrons in argon in crossed electric and magnetic rf fields | |
Two-dimensional images of radiative and metastable excited state radial profiles for an inductively coupled plasma in argon | |
プラズマエレクトロニクス | |
確率過程 | |
確率過程 : 理工学基礎確率の基礎からランダム・プロセスまで |